Vasilache, Dan Adrian
 Distribuzione geografica
Continente #
NA - Nord America 678
EU - Europa 345
AS - Asia 81
Continente sconosciuto - Info sul continente non disponibili 7
SA - Sud America 2
Totale 1.113
Nazione #
US - Stati Uniti d'America 678
SE - Svezia 84
DE - Germania 72
UA - Ucraina 57
FI - Finlandia 42
CN - Cina 27
HK - Hong Kong 26
IE - Irlanda 26
BE - Belgio 18
VN - Vietnam 18
RU - Federazione Russa 12
GB - Regno Unito 10
IT - Italia 10
EU - Europa 7
FR - Francia 4
IN - India 4
NL - Olanda 4
PL - Polonia 3
SG - Singapore 3
IR - Iran 2
PT - Portogallo 2
AR - Argentina 1
BR - Brasile 1
CH - Svizzera 1
TR - Turchia 1
Totale 1.113
Città #
Chandler 170
Jacksonville 124
Ann Arbor 61
Ashburn 35
New York 34
Wilmington 33
Dublin 26
Hong Kong 26
Helsinki 25
Boardman 21
Brussels 18
Dong Ket 18
Woodbridge 18
Brooklyn 17
Shanghai 17
Kronberg 16
Dearborn 15
Phoenix 9
Beijing 7
Hanover 6
Trento 6
Seattle 5
Redmond 4
Mountain View 3
Pune 3
Saint Petersburg 3
Gunzenhausen 2
Radomsko 2
Redwood City 2
Santa Clara 2
Singapore 2
Tappahannock 2
Zanjan 2
Absecon 1
Albignasego 1
Cologne 1
Des Moines 1
Falkenstein 1
Ferrara 1
Hefei 1
Leawood 1
Los Angeles 1
Monmouth Junction 1
Mysiadło 1
Nanchang 1
North Bergen 1
Nuremberg 1
San Jose 1
Sanayi 1
Senigallia 1
St Petersburg 1
São Luís 1
Villigen 1
Totale 754
Nome #
Conductive through silicon via holes for RF applications 99
Wafer resistivity influence over DRIE processes for TSVs manufacturing 88
OPTIMIZED DRIE PROCESS FOR TAPERED WALLS THROUGH WAFER VIA HOLES MANUFACTURING 77
Fabrication of Through-Wafer Interconnections by Gold Electroplating 72
Thermocompression bonding for 3D RF MEMS devices using gold and silver as intermediate layer 71
BRIDGE TYPE AND CANTILEVER TYPE MEMS SWITCH STRUCTURES 68
New Deep Reactive Ion Etching process for through wafer via manufacturing 68
V-shape through wafer via manufactured by drie variable isotropy process 67
STUDY OF AN ELECTRO-MECHANIC MECHANISM EXPLOITING IN-PLANE ROTATION FOR THE REALIZATION OF TUNEABLE CAPACITORS 67
Tappered walls via holes manufactured using DRIE variable isotropy process 60
Tapered walls via holes manufactured using DRIE variable isotropy process 60
Variable isotropy Deep RIE process for through wafer via holes manufacturing 59
Through wafer via holes manufacturing by variable isotropy Deep RIE process for RF applications 58
Design and Optimization of Microwave Lumped Elements Fllters using mixed Circuital-Electromagnetic Simulations 57
Tapered walls via holes manufactured using DRIE variable isotropy process 55
MEMS Switch for 60 GHz Band 53
Compact lumped elements micromachined band-pass filters with discrete switching for 1.8/5.2 GHz applications 44
Totale 1.123
Categoria #
all - tutte 5.263
article - articoli 0
book - libri 0
conference - conferenze 0
curatela - curatele 0
other - altro 0
patent - brevetti 0
selected - selezionate 0
volume - volumi 0
Totale 5.263


Totale Lug Ago Sett Ott Nov Dic Gen Feb Mar Apr Mag Giu
2018/20194 0 0 0 0 0 0 0 0 0 0 3 1
2019/2020157 20 17 2 3 23 9 22 4 20 7 17 13
2020/2021194 27 0 18 16 17 8 26 2 0 34 12 34
2021/2022117 6 1 0 29 2 0 5 13 3 7 33 18
2022/2023313 15 37 6 63 17 49 11 17 62 21 11 4
2023/2024193 22 9 25 10 11 52 13 22 1 28 0 0
Totale 1.123