The higher degree of instrumental automation becomes increasingly important in order to reduce the operator attendance for SIMS analyses. Concurrently a high repeatability is demanded from these instruments to guarantee process reproducibility or material uniformity. This work is focused on the depth profiling repeatability obtained from the new magnetic sector SIMS instrument CAMECA SC-Ultra 300 for arsenic, boron and phosphorous implants in silicon. The short–term repeatability has been evaluated by performing a continuous sequence of automatic measurements: RSF repeatability better then 1% has been obtained over a single day. Additionally the long-term repeatability has been evaluated by repeating several weeks later the same measurements with the instrumental presets stored by software, i.e. without changes in the analytical parameters. The RSF repeatability values are about 3% for As with cesium source and 5% for B with oxygen primary beam
Short-term and long-term RSF repeatability for CAMECA SC-Ultra SIMS measurements
Barozzi, Mario;Giubertoni, Damiano;Anderle, Mariano;Bersani, Massimo
2004-01-01
Abstract
The higher degree of instrumental automation becomes increasingly important in order to reduce the operator attendance for SIMS analyses. Concurrently a high repeatability is demanded from these instruments to guarantee process reproducibility or material uniformity. This work is focused on the depth profiling repeatability obtained from the new magnetic sector SIMS instrument CAMECA SC-Ultra 300 for arsenic, boron and phosphorous implants in silicon. The short–term repeatability has been evaluated by performing a continuous sequence of automatic measurements: RSF repeatability better then 1% has been obtained over a single day. Additionally the long-term repeatability has been evaluated by repeating several weeks later the same measurements with the instrumental presets stored by software, i.e. without changes in the analytical parameters. The RSF repeatability values are about 3% for As with cesium source and 5% for B with oxygen primary beamI documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
