High-k dielectrics as SrxTi1-xOy (STO) are of great interest for the development of dynamic random access memory (DRAM) devices. The characterization of these nanolayers is important. SIMS depth profiling through TiN and STO films is affected by strong artifacts in different ways. The erosion process causes surface topography modifications both in the TiN/STO/TiN layer system and in the silicon substrate. AFM analyses have been carried out on pristine TiN and STO film surfaces and at various crater depths. Very different roughness evolutions are identified for TiN or STO films, within the SIMS craters sputtered with 500 eV Cs+ while using eucentric stage rotation.
TiN/STO/TiN MIMcaps nanolayers on silicon characterized by SIMS and AFM
Barozzi, Mario;Iacob, Erica;Bersani, Massimo
2013-01-01
Abstract
High-k dielectrics as SrxTi1-xOy (STO) are of great interest for the development of dynamic random access memory (DRAM) devices. The characterization of these nanolayers is important. SIMS depth profiling through TiN and STO films is affected by strong artifacts in different ways. The erosion process causes surface topography modifications both in the TiN/STO/TiN layer system and in the silicon substrate. AFM analyses have been carried out on pristine TiN and STO film surfaces and at various crater depths. Very different roughness evolutions are identified for TiN or STO films, within the SIMS craters sputtered with 500 eV Cs+ while using eucentric stage rotation.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
