Systems consisting of sequential layers of hard and soft carbon films were deposited on Si substrates by sputtering and PACVD. A full characterization of the film and of the interfaces is considered crucial to obtain a correlation between the mechanical properties and the chemical composition and architecture of the films. In this work the AES depth profiling technique was applied to study the chemical composition of the film and of the different interfaces (hard/soft layers; film/substrate). In particular we focused on an optimization of the depth resolution parameters. A strong period-thickness effect on the film/substrate interface width was observed. Sputtering induced roughness was also evaluated to check its effect on the interface width and on its morphological changes.
Interface effects in hard-soft carbon multilayered films by AES depth profiling
Micheli, Victor;Bensaada Laidani, Nadhira;Gottardi, Gloria;Bartali, Ruben;Anderle, Mariano
2007-01-01
Abstract
Systems consisting of sequential layers of hard and soft carbon films were deposited on Si substrates by sputtering and PACVD. A full characterization of the film and of the interfaces is considered crucial to obtain a correlation between the mechanical properties and the chemical composition and architecture of the films. In this work the AES depth profiling technique was applied to study the chemical composition of the film and of the different interfaces (hard/soft layers; film/substrate). In particular we focused on an optimization of the depth resolution parameters. A strong period-thickness effect on the film/substrate interface width was observed. Sputtering induced roughness was also evaluated to check its effect on the interface width and on its morphological changes.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
