Monte Carlo computations of the electron backscattering coefficient as a function of the primary energy in the range 500 eV–5 keV for several bulk targets (Al, Si, Cr, Ni, Cu, Ge, Au) are provided. Monte Carlo simulated backscattering coefficients from several surface thin layers are also provided as a function of the electron primary energy and film thicknesses. While the elastic scattering cross-sections have been calculated by the relativistic partial wave expansion method, the stopping power data utilized by theMonte Carlo code are taken from the literature.

Monte Carlo computations of the electron backscattering coefficient for bulk targets and surface thin films

Dapor, Maurizio
2008-01-01

Abstract

Monte Carlo computations of the electron backscattering coefficient as a function of the primary energy in the range 500 eV–5 keV for several bulk targets (Al, Si, Cr, Ni, Cu, Ge, Au) are provided. Monte Carlo simulated backscattering coefficients from several surface thin layers are also provided as a function of the electron primary energy and film thicknesses. While the elastic scattering cross-sections have been calculated by the relativistic partial wave expansion method, the stopping power data utilized by theMonte Carlo code are taken from the literature.
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11582/3540
 Attenzione

Attenzione! I dati visualizzati non sono stati sottoposti a validazione da parte dell'ateneo

Citazioni
  • ???jsp.display-item.citation.pmc??? ND
social impact