Monte Carlo computations of the electron backscattering coefficient as a function of the primary energy in the range 500 eV–5 keV for several bulk targets (Al, Si, Cr, Ni, Cu, Ge, Au) are provided. Monte Carlo simulated backscattering coefficients from several surface thin layers are also provided as a function of the electron primary energy and film thicknesses. While the elastic scattering cross-sections have been calculated by the relativistic partial wave expansion method, the stopping power data utilized by theMonte Carlo code are taken from the literature.
Monte Carlo computations of the electron backscattering coefficient for bulk targets and surface thin films
Dapor, Maurizio
2008-01-01
Abstract
Monte Carlo computations of the electron backscattering coefficient as a function of the primary energy in the range 500 eV–5 keV for several bulk targets (Al, Si, Cr, Ni, Cu, Ge, Au) are provided. Monte Carlo simulated backscattering coefficients from several surface thin layers are also provided as a function of the electron primary energy and film thicknesses. While the elastic scattering cross-sections have been calculated by the relativistic partial wave expansion method, the stopping power data utilized by theMonte Carlo code are taken from the literature.File in questo prodotto:
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