Elastic amorphous carbon films were deposited by continuous and pulsed-plasma sputtering on polyethylene terephtalate (PET) for gas barrier applications. A study was done of the influence of the plasma parameters on the morphological, mechanical, structural properties of the films. Graphite was used as the sputtering target either in argon-hydrogen RF plasmas. In the pulsed mode operation (on/off), pulse frequencies within the (1-100) kHz range were applied. Pulsing resulted in an enhanced deposition rate and in changes in the ion population composition of the plasma, namely an increase of the hydrogenic ion proportion with the low frequencies. This influenced both the elasticity of the films and the disorder in the atomic structure. Correlations between the plasma process parameters and the permeation properties of the films to He were also made
Carbon film deposition on polyethylene terephtalate by pulsed-plasma technology
Bensaada Laidani, Nadhira;Bartali, Ruben;Anderle, Mariano;
2005-01-01
Abstract
Elastic amorphous carbon films were deposited by continuous and pulsed-plasma sputtering on polyethylene terephtalate (PET) for gas barrier applications. A study was done of the influence of the plasma parameters on the morphological, mechanical, structural properties of the films. Graphite was used as the sputtering target either in argon-hydrogen RF plasmas. In the pulsed mode operation (on/off), pulse frequencies within the (1-100) kHz range were applied. Pulsing resulted in an enhanced deposition rate and in changes in the ion population composition of the plasma, namely an increase of the hydrogenic ion proportion with the low frequencies. This influenced both the elasticity of the films and the disorder in the atomic structure. Correlations between the plasma process parameters and the permeation properties of the films to He were also madeI documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
