In this work, TiO2 films produced by rf sputtering of a TiO2 target, in argon and argon-oxygen plasmas were studied. The oxygen content in the feed gas was varied in a range of 3% – 20%. The chemical composition and structure of films were characterized by Rutherford backscattering spectrometry (RBS), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction. Important information about the intrinsic defects of the films and their effects on the optical properties as well as a scheme of the energy band structure of the films could be derived from a combined use of optical spectroscopy and XPS.

Intrinsic defects and their influence on the chemical and optical properties of TiO2-x films

Bensaada Laidani, Nadhira;Bartali, Ruben;Gottardi, Gloria;Luciu, Ioana;Micheli, Victor
2010

Abstract

In this work, TiO2 films produced by rf sputtering of a TiO2 target, in argon and argon-oxygen plasmas were studied. The oxygen content in the feed gas was varied in a range of 3% – 20%. The chemical composition and structure of films were characterized by Rutherford backscattering spectrometry (RBS), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction. Important information about the intrinsic defects of the films and their effects on the optical properties as well as a scheme of the energy band structure of the films could be derived from a combined use of optical spectroscopy and XPS.
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11582/17089
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