Intrinsic defects and their influence on the chemical and optical properties of TiO2-x films

Bensaada Laidani, Nadhira; Cheyssac, P.; Perrière, J.; Bartali, Ruben; Gottardi, Gloria; Luciu, Ioana; Micheli, Victor

doi:10.1088/0022-3727/43/48/485402

In this work, TiO2 films produced by rf sputtering of a TiO2 target, in argon and argon-oxygen plasmas were studied. The oxygen content in the feed gas was varied in a range of 3% – 20%. The chemical composition and structure of films were characterized by Rutherford backscattering spectrometry (RBS), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction. Important information about the intrinsic defects of the films and their effects on the optical properties as well as a scheme of the energy band structure of the films could be derived from a combined use of optical spectroscopy and XPS.

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Titolo:	Intrinsic defects and their influence on the chemical and optical properties of TiO2-x films
Autori:	Bensaada Laidani, Nadhira P. Cheyssac J. Perrière Bartali, Ruben Gottardi, Gloria Luciu, Ioana Micheli, Victor mostra contributor esterni nascondi contributor esterni
Data di pubblicazione:	2010
Rivista:	JOURNAL OF PHYSICS. D, APPLIED PHYSICS
Abstract:	In this work, TiO2 films produced by rf sputtering of a TiO2 target, in argon and argon-oxygen plasmas were studied. The oxygen content in the feed gas was varied in a range of 3% – 20%. The chemical composition and structure of films were characterized by Rutherford backscattering spectrometry (RBS), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction. Important information about the intrinsic defects of the films and their effects on the optical properties as well as a scheme of the energy band structure of the films could be derived from a combined use of optical spectroscopy and XPS.
Handle:	http://hdl.handle.net/11582/17089
Appare nelle tipologie:	1.1 Articolo in rivista

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