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EnglishIn this work, TiO2 films produced by rf sputtering of a TiO2 target, in argon and argon-oxygen plasmas were studied. The oxygen content in the feed gas was varied in a range of 3% – 20%. The chemical composition and structure of films were characterized by Rutherford backscattering spectrometry (RBS), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction. Important information about the intrinsic defects of the films and their effects on the optical properties as well as a scheme of the energy band structure of the films could be derived from a combined use of optical spectroscopy and XPS.
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| Titolo: | Intrinsic defects and their influence on the chemical and optical properties of TiO2-x films |
| Autori: | |
| Data di pubblicazione: | 2010 |
| Rivista: | |
| Abstract: | In this work, TiO2 films produced by rf sputtering of a TiO2 target, in argon and argon-oxygen plasmas were studied. The oxygen content in the feed gas was varied in a range of 3% – 20%. The chemical composition and structure of films were characterized by Rutherford backscattering spectrometry (RBS), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction. Important information about the intrinsic defects of the films and their effects on the optical properties as well as a scheme of the energy band structure of the films could be derived from a combined use of optical spectroscopy and XPS. |
| Handle: | http://hdl.handle.net/11582/17089 |
| Appare nelle tipologie: | 1.1 Articolo in rivista |
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http://hdl.handle.net/11582/17089
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