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EnglishActivation/deactivation of 500eV B implants in pre-amorphised Si after non-melt laser annealing with multiple scans at 1150°C and isochronal rapid thermal post-annealing has been investigated. Under the thermal conditions used for non-melt laser at 1150°C, a substantial residue of end-of-range defects remained after 1 laser scan, evidenced by end-of-range defect decoration by B atoms after 700°C post-annealing and by transient enhanced diffusion after 800°C post-annealing. Dramatic boron deactivation is also observed after post-annealing the 1-scan samples. Most of these features were not present in samples receiving 5 or 10 laser scans, indicating that the end-of-range defects had been stabilised or dissolved within 5 and 10 scans. The results show that the detrimental effects of end-of-range defects can be removed during non-melt laser annealing and is therefore an achievable method for stabilisation of highly activated B profiles in pre-amorphised Si.
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| Titolo: | Deactivation of low energy boron implants into preamorphized Si after non-melt laser annealing with multiple scans | |
| Autori: | ||
| Data di pubblicazione: | 2006 | |
| Abstract: | Activation/deactivation of 500eV B implants in pre-amorphised Si after non-melt laser annealing with multiple scans at 1150°C and isochronal rapid thermal post-annealing has been investigated. Under the thermal conditions used for non-melt laser at 1150°C, a substantial residue of end-of-range defects remained after 1 laser scan, evidenced by end-of-range defect decoration by B atoms after 700°C post-annealing and by transient enhanced diffusion after 800°C post-annealing. Dramatic boron deactivation is also observed after post-annealing the 1-scan samples. Most of these features were not present in samples receiving 5 or 10 laser scans, indicating that the end-of-range defects had been stabilised or dissolved within 5 and 10 scans. The results show that the detrimental effects of end-of-range defects can be removed during non-melt laser annealing and is therefore an achievable method for stabilisation of highly activated B profiles in pre-amorphised Si. | |
| Handle: | http://hdl.handle.net/11582/3739 | |
| Appare nelle tipologie: | 4.1 Contributo in Atti di convegno |
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