A one-step graphene patterning method is developed in this paper. A phase shifting mask is used to modulate incident laser beam spatially and generate graphene patterns by laser heating. Periodic graphene nanoribbon and nanomesh structures are fabricated by employing 1D and 2D phase shifting masks, respectively. The noncontact, simple procedure, easy handling and economic properties of this method make it promising towards graphene-based device fabrication.
Phase shifting mask modulated laser patterning on graphene
Liu, F.;
2017-01-01
Abstract
A one-step graphene patterning method is developed in this paper. A phase shifting mask is used to modulate incident laser beam spatially and generate graphene patterns by laser heating. Periodic graphene nanoribbon and nanomesh structures are fabricated by employing 1D and 2D phase shifting masks, respectively. The noncontact, simple procedure, easy handling and economic properties of this method make it promising towards graphene-based device fabrication.File in questo prodotto:
File | Dimensione | Formato | |
---|---|---|---|
Gao_2017_Nanotechnology_28_045304.pdf
solo utenti autorizzati
Licenza:
NON PUBBLICO - Accesso privato/ristretto
Dimensione
1.81 MB
Formato
Adobe PDF
|
1.81 MB | Adobe PDF | Visualizza/Apri Richiedi una copia |
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.