Size-controlled Cu and Au nanoparticles were deposited onto low vapor pressure liquid by RF magnetron sputtering. The deposition protocol was optimized to gain good control over plasma parameters and host liquid features to tune the physical properties of the resulting nanofluid. This work aims at developing a green and one-step approach in the synthesis of ultrapure catalyst nanoparticles.
RF Sputtering onto Liquid Substrates for a Dry Single-Step Preparation of Nanofluids
C. R. Chandraiahgari
Investigation
;G. GottardiSupervision
;V. Micheli;R. Bartali
2024-01-01
Abstract
Size-controlled Cu and Au nanoparticles were deposited onto low vapor pressure liquid by RF magnetron sputtering. The deposition protocol was optimized to gain good control over plasma parameters and host liquid features to tune the physical properties of the resulting nanofluid. This work aims at developing a green and one-step approach in the synthesis of ultrapure catalyst nanoparticles.File in questo prodotto:
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