Size-controlled Cu and Au nanoparticles were deposited onto low vapor pressure liquid by RF magnetron sputtering. The deposition protocol was optimized to gain good control over plasma parameters and host liquid features to tune the physical properties of the resulting nanofluid. This work aims at developing a green and one-step approach in the synthesis of ultrapure catalyst nanoparticles.

RF Sputtering onto Liquid Substrates for a Dry Single-Step Preparation of Nanofluids

C. R. Chandraiahgari
Investigation
;
G. Gottardi
Supervision
;
V. Micheli;R. Bartali
2024-01-01

Abstract

Size-controlled Cu and Au nanoparticles were deposited onto low vapor pressure liquid by RF magnetron sputtering. The deposition protocol was optimized to gain good control over plasma parameters and host liquid features to tune the physical properties of the resulting nanofluid. This work aims at developing a green and one-step approach in the synthesis of ultrapure catalyst nanoparticles.
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11582/349908
 Attenzione

Attenzione! I dati visualizzati non sono stati sottoposti a validazione da parte dell'ateneo

Citazioni
  • ???jsp.display-item.citation.pmc??? ND
social impact