Photon detecting devices have been extensively investigated over the last years to improve detection efficiency and timing resolution. In this study we focused on thin silicon photodiodes and exploited the effects of Surface Plasmon Polaritons (SSP), which can transform light into highly confined modes, boosting NIR photon absorption near the active depth of the devices. The goal of this contribution is to enhance the detection of a silicon photodiode by integrating a silver plasmonic nanoarray directly on the active area of the devices using Electron Beam Lithography (EBL) and Ag evaporation/ lift-off.

Light detection enhancement in Near Infra-red by 2-dimensional Silver nanograting integrated by Electron Beam Lithography

E. Scattolo;A. Cian;D. Giubertoni;G. Paternoster;P. Bellutti;
2022-01-01

Abstract

Photon detecting devices have been extensively investigated over the last years to improve detection efficiency and timing resolution. In this study we focused on thin silicon photodiodes and exploited the effects of Surface Plasmon Polaritons (SSP), which can transform light into highly confined modes, boosting NIR photon absorption near the active depth of the devices. The goal of this contribution is to enhance the detection of a silicon photodiode by integrating a silver plasmonic nanoarray directly on the active area of the devices using Electron Beam Lithography (EBL) and Ag evaporation/ lift-off.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11582/335925
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