In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michel- son interferometer, where Q values up to 1.3 × 10^6 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical nesse up to 50000 has been observed.

Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications

Serra, Enrico;Borrielli, Antonio Lorenzo;Bonaldi, Michele
2016

Abstract

In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michel- son interferometer, where Q values up to 1.3 × 10^6 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical nesse up to 50000 has been observed.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11582/304453
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