In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michel- son interferometer, where Q values up to 1.3 × 10^6 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical nesse up to 50000 has been observed.
Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications
Serra, Enrico;Borrielli, Antonio Lorenzo;Bonaldi, Michele
2016-01-01
Abstract
In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michel- son interferometer, where Q values up to 1.3 × 10^6 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical nesse up to 50000 has been observed.File in questo prodotto:
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