Thin films of zirconia-carbon (ZrO2-x-C) were deposited by RF magnetron sputtering, on both polycarbonate and cemented-WC substrates. Two separate targets of monoclinic ZrO2 and graphite were used and a composition range was selected from 0 to ≈ 30 at.% carbon. The C-containing films resulted in a composite structure, which consisted of a zirconia phase coexisting with an amorphous carbon phase. A tetragonal zirconia phase was found in films containing 10-30 at.% carbon, while films of pure zirconia grew in the monoclinic phase. The tetragonal phase of zirconia coincided with the presence of compressive internal stresses in the films, which increased with increasing C content. As a consequences of the microstructure induced by the presence of carbon, the ZrO2-x-C films resulted in a stronger surface hardening of the polymeric substrates than the pure zirconia films did.
Carbon effect on the phase structure and the hardness of r.f. sputtered zirconia films
Bensaada Laidani, Nadhira;Micheli, Victor;Anderle, Mariano
2001-01-01
Abstract
Thin films of zirconia-carbon (ZrO2-x-C) were deposited by RF magnetron sputtering, on both polycarbonate and cemented-WC substrates. Two separate targets of monoclinic ZrO2 and graphite were used and a composition range was selected from 0 to ≈ 30 at.% carbon. The C-containing films resulted in a composite structure, which consisted of a zirconia phase coexisting with an amorphous carbon phase. A tetragonal zirconia phase was found in films containing 10-30 at.% carbon, while films of pure zirconia grew in the monoclinic phase. The tetragonal phase of zirconia coincided with the presence of compressive internal stresses in the films, which increased with increasing C content. As a consequences of the microstructure induced by the presence of carbon, the ZrO2-x-C films resulted in a stronger surface hardening of the polymeric substrates than the pure zirconia films did.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
