Multilayered insulator films with thickness up to 2 m are under development for applications in microwave integrated circuits as insulators and mechanical carriers. The targeted microwave integrated circuits will be realised on low residual stress dielectric membranes or on separated insulator films formed by bulk micromachining. The suspended microwave circuits are expected to exhibit reduced loss due to avoiding losses in the semiconductor substrate. Similar layers are often used also for sensor fabrications. The studied insulator films containing layers of SiOxNy with different composition and thickness have been grown on Si substrates. The electrical behaviour have been studied by current-voltage and capacitance-voltage measurements at room temperature. The composition and preparation conditions affected the electrical behaviour of the studied insulator films rather strong, while the film thickness exhibited a weak influence only. In this paper the obtained results will be compared and analysed. This work has been supported by the Commission of European Communities under COPERNICUS Grant No. 997131

Electrical Study of Insulator Films for Microwave Applications

Giacomozzi, Flavio;
2000-01-01

Abstract

Multilayered insulator films with thickness up to 2 m are under development for applications in microwave integrated circuits as insulators and mechanical carriers. The targeted microwave integrated circuits will be realised on low residual stress dielectric membranes or on separated insulator films formed by bulk micromachining. The suspended microwave circuits are expected to exhibit reduced loss due to avoiding losses in the semiconductor substrate. Similar layers are often used also for sensor fabrications. The studied insulator films containing layers of SiOxNy with different composition and thickness have been grown on Si substrates. The electrical behaviour have been studied by current-voltage and capacitance-voltage measurements at room temperature. The composition and preparation conditions affected the electrical behaviour of the studied insulator films rather strong, while the film thickness exhibited a weak influence only. In this paper the obtained results will be compared and analysed. This work has been supported by the Commission of European Communities under COPERNICUS Grant No. 997131
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11582/1914
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