We have fabricated and characterized Si-implanted thermistors to be used as phonon sensors in very-low-temperature, single-quantum detectors. After a short review of the required thermistor properties for this type of application, a detailed description of the production process and of the characterization experimental techniques is reported. The data show that the resistivity-temperature behaviour of all the devices follows the prediction of the variable range hopping conduction model in the investigated temperature range (4.2-0.03 K). Phonon-electron decoupling and excess low-frequency noise show up at low temperatures, reducing the thermistor sensitivity. These phenomena are discussed and conveniently parametrized in view of a complete detector optimization
Fabrication and low-temperature characterization of Si-implanted thermistors
Ferrario, Lorenza;Margesin, Benno;
1999-01-01
Abstract
We have fabricated and characterized Si-implanted thermistors to be used as phonon sensors in very-low-temperature, single-quantum detectors. After a short review of the required thermistor properties for this type of application, a detailed description of the production process and of the characterization experimental techniques is reported. The data show that the resistivity-temperature behaviour of all the devices follows the prediction of the variable range hopping conduction model in the investigated temperature range (4.2-0.03 K). Phonon-electron decoupling and excess low-frequency noise show up at low temperatures, reducing the thermistor sensitivity. These phenomena are discussed and conveniently parametrized in view of a complete detector optimizationI documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
