We have computed, by a Monte Carlo code, the backscattering coefficient of low-medium energy electron beams (from 250 eV to 10,000 eV) impinging on carbon films deposited on two different substrates (Al and Cu). Investigating the behaviour of the backscattering coefficient as a function of the primary energy for various surface film thicknesses, we have found an interesting property, i.e. the appearance of relative maxima of absorption (and relative minima of backscattering). A characteristic of the relative minima is that their position shifts towards higher energies, while the peaks are broadening, as the film thickness increases. The trend presented can be used as a way to measure the carbon film thickness by a set of measures of the backscattering coefficient

Monte Carlo Simulation of Electrons Backscattered from Surface Carbon Films

Dapor, Maurizio
2005

Abstract

We have computed, by a Monte Carlo code, the backscattering coefficient of low-medium energy electron beams (from 250 eV to 10,000 eV) impinging on carbon films deposited on two different substrates (Al and Cu). Investigating the behaviour of the backscattering coefficient as a function of the primary energy for various surface film thicknesses, we have found an interesting property, i.e. the appearance of relative maxima of absorption (and relative minima of backscattering). A characteristic of the relative minima is that their position shifts towards higher energies, while the peaks are broadening, as the film thickness increases. The trend presented can be used as a way to measure the carbon film thickness by a set of measures of the backscattering coefficient
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11582/2365
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