We have computed, by a Monte Carlo code, the backscattering coefficient of low-medium energy electron beams (from 250 eV to 10,000 eV) impinging on carbon films deposited on two different substrates (Al and Cu). Investigating the behaviour of the backscattering coefficient as a function of the primary energy for various surface film thicknesses, we have found an interesting property, i.e. the appearance of relative maxima of absorption (and relative minima of backscattering). A characteristic of the relative minima is that their position shifts towards higher energies, while the peaks are broadening, as the film thickness increases. The trend presented can be used as a way to measure the carbon film thickness by a set of measures of the backscattering coefficient
Monte Carlo Simulation of Electrons Backscattered from Surface Carbon Films
Dapor, Maurizio
2005-01-01
Abstract
We have computed, by a Monte Carlo code, the backscattering coefficient of low-medium energy electron beams (from 250 eV to 10,000 eV) impinging on carbon films deposited on two different substrates (Al and Cu). Investigating the behaviour of the backscattering coefficient as a function of the primary energy for various surface film thicknesses, we have found an interesting property, i.e. the appearance of relative maxima of absorption (and relative minima of backscattering). A characteristic of the relative minima is that their position shifts towards higher energies, while the peaks are broadening, as the film thickness increases. The trend presented can be used as a way to measure the carbon film thickness by a set of measures of the backscattering coefficientFile | Dimensione | Formato | |
---|---|---|---|
usr-dapor-1-paper.pdf
non disponibili
Tipologia:
Documento in Post-print
Licenza:
NON PUBBLICO - Accesso privato/ristretto
Dimensione
366.69 kB
Formato
Adobe PDF
|
366.69 kB | Adobe PDF | Visualizza/Apri Richiedi una copia |
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.