Demenev, Evgeny

Demenev, Evgeny  

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Titolo Data di pubblicazione Autore(i) File
32-Channel Detection Unit for Combined XRF-XRD in Mining Transportable Applications 1-gen-2020 Carminati, M.; Amirkhani, A.; Gugiatti, M.; Ferrara, E.; Fiorini, C.; Demenev, E.; Pepponi, G.; Ronchin, S.; Ficorella, F.; Borghi, G.; Zorzi, N.; Borovin, E.; Lutterotti, L.
32-Channel silicon strip detection module for combined X-ray fluorescence spectroscopy and X-ray diffractometry analysis 1-gen-2022 Carminati, Marco; Borghi, Giacomo; Demenev, Evgeny; Gugiatti, Matteo; Pepponi, Giancarlo; Crivellari, Michele; Ficorella, Francesco; Ronchin, Sabina; Zorzi, Nicola; Borovin, Evgeny; Lutterotti, Luca; Fiorini, Carlo
Arsenic redistribution after solid phase epitaxial regrowth of shallow pre-amorphized silicon layers 1-gen-2012 Demenev, Evgeny; Giubertoni, Damiano; Gennaro, Salvatore; Bersani, Massimo; E., Hourdakis; A. G., Nassiopoulou; M. A., Reading; J. A., van den Berg
Calibration correction of ultra low energy SIMS profiles based on MEIS analyses for arsenic shallow implants in silicon 1-gen-2012 Demenev, Evgeny; Giubertoni, Damiano; J., van den Berg; M., Reading; Bersani, Massimo
Calibration correction of ultra low energy SIMS profiles based on MEIS analysis of shallow arsenic implants in silicon 1-gen-2013 Demenev, Evgeny; Giubertoni, Damiano; M. A., Reading; P., Bailey; T. C. Q., Noakes; Bersani, Massimo; J. A., van den Berg
Columnar nano-void formation on Germanium under Sn+ ion implantation: Ge1-xSnx walls 1-gen-2014 M. Secchi; E. Demenev; D. Giubertoni; L. Vanzetti; M. Bersani
Columnar nano-void formation on Germanium under Sn+ ion implantation: Ge1-xSnx walls 1-gen-2014 M.Secchi; E. Demenev; D. Giubertoni; L. Vanzetti; M. Bersani
Combined evaluation of grazing incidence X-ray fluorescence and X-ray reflectivity data for improved profiling of ultra-shallow depth distributions 1-gen-2014 D., Ingerle; F., Meirer; Pepponi, Giancarlo; Demenev, Evgeny; Giubertoni, Damiano; P., Wobrauschek; C., Streli
Development of MEMS MOS gas sensors with CMOS compatible PECVD inter-metal passivation 1-gen-2019 Bagolini, Alvise; Gaiardo, Andrea; Crivellari, Michele; Demenev, Evgeny; Bartali, Ruben; Picciotto, Antonino; Valt, Matteo; Ficorella, Francesco; Guidi, Vincenzo; Bellutti, Pierluigi
Development of nano-roughness under SIMS ion sputtering of germanium surfaces 1-gen-2013 Iacob, Erica; Demenev, Evgeny; Giubertoni, Damiano; Barozzi, Mario; Gennaro, Salvatore; Bersani, Massimo
Development of nano-roughness under SIMS ion sputtering of Germanium surfaces 1-gen-2011 Iacob, Erica; Barozzi, Mario; Demenev, Evgeny; Gennaro, Salvatore; Giubertoni, Damiano; Bersani, Massimo
Development of nano-topography during SIMS characterization of Ge1-xSnx alloy 1-gen-2014 M. Secchi; E. Demenev; D. Giubertoni; E. Iacob; M. Bersani
Development of nano-topography during SIMS characterization of Ge1-xSnx alloy 1-gen-2014 M. Secchi; E. Demenev; D. Giubertoni; E. Iacob; M. Bersani
Development of nanotopography during SIMS characterization of thin films of Ge1−xSnx alloy 1-gen-2015 Secchi, Maria; Demenev, Evgeny; C, ; Colaux, J. L.; Giubertoni, Damiano; Dell'Anna, Rossana; Iacob, Erica; Gwilliam, R. M.; Jeynes, C.; Bersani, Massimo
Dynamic SIMS Application for Characterization of Advanced Doping Schemes in Semiconductors 1-gen-2013 Giubertoni, Damiano; Demenev, Evgeny; Meirer, Florian; Bersani, Massimo
Dynamic SIMS Characterization of Ge1-xSnx alloy 1-gen-2013 Secchi, Maria; Demenev, Evgeny; Giubertoni, Damiano; Bersani, Massimo
Dynamic SIMS Characterization of Ge1-xSnx alloy 1-gen-2013 Secchi, Maria; Demenev, Evgeny; Giubertoni, Damiano; Bersani, Massimo
Evolution of arsenic in high fluence plasma immersion ion implanted silicon: Behavior of the as-implanted surface 1-gen-2015 Vishwanath, V.; Demenev, Evgeny; Giubertoni, Damiano; Vanzetti, Lia Emanuela; Koh, A. L.; Steinhauser, G.; Pepponi, Giancarlo; Bersani, Massimo; Meirer, Florian; Foad, M. A.
Evolution of Arsenic nanometric distributions in Silicon under advanced ion implantation and annealing processes 1-gen-2013 Demenev, Evgeny; Giubertoni, Damiano
Formation of arsenic rich silicon oxide under plasma immersion ion implantation and laser annealing 1-gen-2012 Meirer, Florian; Demenev, Evgeny; Giubertoni, Damiano; Gennaro, Salvatore; Vanzetti, Lia Emanuela; Pepponi, Giancarlo; Bersani, Massimo; M. A., Sahiner; G., Steinhauser; M. A., Foad; J. C., Woicik; A., Mehta; P., Pianetta