Sfoglia per Autore
Time-dependent observations of arsenic ultra shallow junctions formed by AsH3 Plasma Immersion Ion Implantation and Deposition in Silicon
2013-01-01 Meirer, Florian; Demenev, Evgeny; Giubertoni, Damiano; Gennaro, Salvatore; Vanzetti, Lia Emanuela; Pepponi, Giancarlo; Steinhauser, G.; Vishwanath, V.; Mehta, A.; Pianetta, P.; Bersani, Massimo; Foad, M.
Proceedings of the Eighteenth International Conference on Secondary Ion Mass Spectrometry, SIMS XVIII, Riva Del Garda, Trento, Italy, September 18 - 23, 2011
2013-01-01 E., Napolitani; Giubertoni, Damiano; Bersani, Massimo; Anderle, Mariano; A., Licciardello
Dynamic SIMS Application for Characterization of Advanced Doping Schemes in Semiconductors
2013-01-01 Giubertoni, Damiano; Demenev, Evgeny; Meirer, Florian; Bersani, Massimo
ispettiva di sorveglianza 04-05 Luglio 2013
2013-01-01 Iacob, Erica; Bersani, Massimo; Giubertoni, Damiano; Barozzi, Mario; Vanzetti, Lia Emanuela; Fedrizzi, Michele; Bortolotti, Mauro
Wettability on Ge nano honeycombs created by high fluence ion implantation.
2013-01-01 Secchi, M.; Giubertoni, Damiano; Demenev, Evgeny; Gennaro, S.; Meirer, F.; Iacob, Erica; Lepore, E.; Pugno, N.; Bersani, Massimo
Development of nano-roughness under SIMS ion sputtering of germanium surfaces
2013-01-01 Iacob, Erica; Demenev, Evgeny; Giubertoni, Damiano; Barozzi, Mario; Gennaro, Salvatore; Bersani, Massimo
Calibration correction of ultra low energy SIMS profiles based on MEIS analysis of shallow arsenic implants in silicon
2013-01-01 Demenev, Evgeny; Giubertoni, Damiano; M. A., Reading; P., Bailey; T. C. Q., Noakes; Bersani, Massimo; J. A., van den Berg
Tuning of the Optical Properties of In-rich InxGa1-xN (x=0.82-0.49) Alloys by Light-ion Irradiation at Low Energy.
2013-01-01 M., De Luca; G., Pettinari; A., Polimeni; M., Capizzi; G., Ciatto; L., Amidani; E., Fonda; F., Boscherini; F., Filippone; Aa, Bonapasta; A., Knubel; V., Cimalla; O., Ambacher; Giubertoni, Damiano; Bersani, Massimo
Preface for Proceedings of SIMS XVIII, Riva del Garda, Italy, 2011
2013-01-01 E., Napolitani; Giubertoni, Damiano; Bersani, Massimo; Anderle, Mariano; A., Licciardello
GIXRF characterization of thin Ge1-xSnx films
2014-01-01 Brigidi, Fabio; Secchi, Maria; Demenev, Evgeny; Giubertoni, Damiano; Pepponi, Giancarlo
Grazing incidence x-ray fluorescence modelling of complex surfaces as applied to diffusion barriers for cultural heritage objects
2014-01-01 Brigidi, Fabio; A. E., Marquardt; Demenev, Evgeny; Giubertoni, Damiano; R., Phaneuf; Pepponi, Giancarlo
Columnar nano-void formation on Germanium under Sn+ ion implantation: Ge1-xSnx walls
2014-01-01 Secchi, Maria; Demenev, Evgeny; Giubertoni, Damiano; Vanzetti, Lia Emanuela; Bersani, Massimo
Development of nano-topography during SIMS characterization of Ge1-xSnx alloy
2014-01-01 Secchi, Maria; Demenev, Evgeny; Giubertoni, Damiano; Iacob, Erica; Bersani, Massimo
Development of nano-topography during SIMS characterization of Ge1-xSnx alloy
2014-01-01 Secchi, Maria; Demenev, Evgeny; Giubertoni, Damiano; Iacob, Erica; Bersani, Massimo
Columnar nano-void formation on Germanium under Sn+ ion implantation: Ge1-xSnx walls
2014-01-01 Secchi, Maria; Demenev, Evgeny; Giubertoni, Damiano; Vanzetti, Lia Emanuela; Bersani, Massimo
On an improved boron segregation calibration from a particularly sensitive power MOS process
2014-01-01 Koffel, S.; Burenkov, A.; Sekowski, M.; Pichler, P.; Giubertoni, Damiano; Bersani, Massimo; Knaipp, M.; Wachmann, E.; Schrems, M.; Yamamoto, Y.; Bolze, D.
Observation of point defect injection from electrical de-activation of arsenic ultra-shallow distributions formed by ultra-low energy ion implantation and laser sub-melt annealing
2014-01-01 Demenev, Evgeny; Meirer, Florian; Essa, Z.; Giubertoni, Damiano; Cristiano, F.; Pepponi, Giancarlo; Gennaro, Salvatore; Bersani, Massimo; Foad, M. A.
Deuterium depth profile quantification in a ASDEX Upgrade divertor tile using secondary ion mass spectrometry
2014-01-01 F., Ghezzi; R., Caniello; Giubertoni, Damiano; Bersani, Massimo; A., Hakola; M., Mayer; V., Rohde; M., Anderle; ASDEX Upgrade, Team
Combined evaluation of grazing incidence X-ray fluorescence and X-ray reflectivity data for improved profiling of ultra-shallow depth distributions
2014-01-01 D., Ingerle; F., Meirer; Pepponi, Giancarlo; Demenev, Evgeny; Giubertoni, Damiano; P., Wobrauschek; C., Streli
Surface evolution of very high dose arsenic implants in silicon formed by plasma immersion ion implantation – a long term study
2014-01-01 Meirer, Florian; Demenev, Evgeny; Giubertoni, Damiano; Vanzetti, Lia Emanuela; Gennaro, Salvatore; Fedrizzi, Michele; Pepponi, Giancarlo; Steinhauser, G.; Vishwanath, V.; Foad, M. A.; Bersani, Massimo
| Titolo | Data di pubblicazione | Autore(i) | File |
|---|---|---|---|
| Time-dependent observations of arsenic ultra shallow junctions formed by AsH3 Plasma Immersion Ion Implantation and Deposition in Silicon | 1-gen-2013 | Meirer, Florian; Demenev, Evgeny; Giubertoni, Damiano; Gennaro, Salvatore; Vanzetti, Lia Emanuela; Pepponi, Giancarlo; Steinhauser, G.; Vishwanath, V.; Mehta, A.; Pianetta, P.; Bersani, Massimo; Foad, M. | |
| Proceedings of the Eighteenth International Conference on Secondary Ion Mass Spectrometry, SIMS XVIII, Riva Del Garda, Trento, Italy, September 18 - 23, 2011 | 1-gen-2013 | E., Napolitani; Giubertoni, Damiano; Bersani, Massimo; Anderle, Mariano; A., Licciardello | |
| Dynamic SIMS Application for Characterization of Advanced Doping Schemes in Semiconductors | 1-gen-2013 | Giubertoni, Damiano; Demenev, Evgeny; Meirer, Florian; Bersani, Massimo | |
| ispettiva di sorveglianza 04-05 Luglio 2013 | 1-gen-2013 | Iacob, Erica; Bersani, Massimo; Giubertoni, Damiano; Barozzi, Mario; Vanzetti, Lia Emanuela; Fedrizzi, Michele; Bortolotti, Mauro | |
| Wettability on Ge nano honeycombs created by high fluence ion implantation. | 1-gen-2013 | Secchi, M.; Giubertoni, Damiano; Demenev, Evgeny; Gennaro, S.; Meirer, F.; Iacob, Erica; Lepore, E.; Pugno, N.; Bersani, Massimo | |
| Development of nano-roughness under SIMS ion sputtering of germanium surfaces | 1-gen-2013 | Iacob, Erica; Demenev, Evgeny; Giubertoni, Damiano; Barozzi, Mario; Gennaro, Salvatore; Bersani, Massimo | |
| Calibration correction of ultra low energy SIMS profiles based on MEIS analysis of shallow arsenic implants in silicon | 1-gen-2013 | Demenev, Evgeny; Giubertoni, Damiano; M. A., Reading; P., Bailey; T. C. Q., Noakes; Bersani, Massimo; J. A., van den Berg | |
| Tuning of the Optical Properties of In-rich InxGa1-xN (x=0.82-0.49) Alloys by Light-ion Irradiation at Low Energy. | 1-gen-2013 | M., De Luca; G., Pettinari; A., Polimeni; M., Capizzi; G., Ciatto; L., Amidani; E., Fonda; F., Boscherini; F., Filippone; Aa, Bonapasta; A., Knubel; V., Cimalla; O., Ambacher; Giubertoni, Damiano; Bersani, Massimo | |
| Preface for Proceedings of SIMS XVIII, Riva del Garda, Italy, 2011 | 1-gen-2013 | E., Napolitani; Giubertoni, Damiano; Bersani, Massimo; Anderle, Mariano; A., Licciardello | |
| GIXRF characterization of thin Ge1-xSnx films | 1-gen-2014 | Brigidi, Fabio; Secchi, Maria; Demenev, Evgeny; Giubertoni, Damiano; Pepponi, Giancarlo | |
| Grazing incidence x-ray fluorescence modelling of complex surfaces as applied to diffusion barriers for cultural heritage objects | 1-gen-2014 | Brigidi, Fabio; A. E., Marquardt; Demenev, Evgeny; Giubertoni, Damiano; R., Phaneuf; Pepponi, Giancarlo | |
| Columnar nano-void formation on Germanium under Sn+ ion implantation: Ge1-xSnx walls | 1-gen-2014 | Secchi, Maria; Demenev, Evgeny; Giubertoni, Damiano; Vanzetti, Lia Emanuela; Bersani, Massimo | |
| Development of nano-topography during SIMS characterization of Ge1-xSnx alloy | 1-gen-2014 | Secchi, Maria; Demenev, Evgeny; Giubertoni, Damiano; Iacob, Erica; Bersani, Massimo | |
| Development of nano-topography during SIMS characterization of Ge1-xSnx alloy | 1-gen-2014 | Secchi, Maria; Demenev, Evgeny; Giubertoni, Damiano; Iacob, Erica; Bersani, Massimo | |
| Columnar nano-void formation on Germanium under Sn+ ion implantation: Ge1-xSnx walls | 1-gen-2014 | Secchi, Maria; Demenev, Evgeny; Giubertoni, Damiano; Vanzetti, Lia Emanuela; Bersani, Massimo | |
| On an improved boron segregation calibration from a particularly sensitive power MOS process | 1-gen-2014 | Koffel, S.; Burenkov, A.; Sekowski, M.; Pichler, P.; Giubertoni, Damiano; Bersani, Massimo; Knaipp, M.; Wachmann, E.; Schrems, M.; Yamamoto, Y.; Bolze, D. | |
| Observation of point defect injection from electrical de-activation of arsenic ultra-shallow distributions formed by ultra-low energy ion implantation and laser sub-melt annealing | 1-gen-2014 | Demenev, Evgeny; Meirer, Florian; Essa, Z.; Giubertoni, Damiano; Cristiano, F.; Pepponi, Giancarlo; Gennaro, Salvatore; Bersani, Massimo; Foad, M. A. | |
| Deuterium depth profile quantification in a ASDEX Upgrade divertor tile using secondary ion mass spectrometry | 1-gen-2014 | F., Ghezzi; R., Caniello; Giubertoni, Damiano; Bersani, Massimo; A., Hakola; M., Mayer; V., Rohde; M., Anderle; ASDEX Upgrade, Team | |
| Combined evaluation of grazing incidence X-ray fluorescence and X-ray reflectivity data for improved profiling of ultra-shallow depth distributions | 1-gen-2014 | D., Ingerle; F., Meirer; Pepponi, Giancarlo; Demenev, Evgeny; Giubertoni, Damiano; P., Wobrauschek; C., Streli | |
| Surface evolution of very high dose arsenic implants in silicon formed by plasma immersion ion implantation – a long term study | 1-gen-2014 | Meirer, Florian; Demenev, Evgeny; Giubertoni, Damiano; Vanzetti, Lia Emanuela; Gennaro, Salvatore; Fedrizzi, Michele; Pepponi, Giancarlo; Steinhauser, G.; Vishwanath, V.; Foad, M. A.; Bersani, Massimo |
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