This chapter has the purpose to address several topics where chromium can be encountered in MEMS technology, and the different ways to exploit its unique properties in the fabrication of MEMS and more in general microsystem devices. The aim of this choice is also to collect in a clear and organized way many specific knowledge that can normally be found only scattered around in different and diverse sources of scientific and technological information. The structure of the chapter can be described as follows: first a short introductory section where it is explained what is MEMS technology, what are the general principles of MEMS microfabrication, and the types of devices that can be produced by this technology. Then a brief review of chromium chemical properties relevant for MEMS, also with reference of its compounds, including oxidation behavior and chemical etching properties is given. It follows a discussion on mechanical and physical properties of this metal, and a summary of common deposition techniques (PVD, sputtering, electroplating) for chromium and its compounds. A core section about different uses of chromium in MEMS technology is then presented: chromium for masks in photolithography, chromium as adhesion layer for structural and noble metals, chromium as structural material in thin film resistors and other less frequent uses. Finally a short section on chromium alloys and their exploitation in MEMS applications is reported.
Chromium in MEMS Technology
Mulloni, Viviana
2011-01-01
Abstract
This chapter has the purpose to address several topics where chromium can be encountered in MEMS technology, and the different ways to exploit its unique properties in the fabrication of MEMS and more in general microsystem devices. The aim of this choice is also to collect in a clear and organized way many specific knowledge that can normally be found only scattered around in different and diverse sources of scientific and technological information. The structure of the chapter can be described as follows: first a short introductory section where it is explained what is MEMS technology, what are the general principles of MEMS microfabrication, and the types of devices that can be produced by this technology. Then a brief review of chromium chemical properties relevant for MEMS, also with reference of its compounds, including oxidation behavior and chemical etching properties is given. It follows a discussion on mechanical and physical properties of this metal, and a summary of common deposition techniques (PVD, sputtering, electroplating) for chromium and its compounds. A core section about different uses of chromium in MEMS technology is then presented: chromium for masks in photolithography, chromium as adhesion layer for structural and noble metals, chromium as structural material in thin film resistors and other less frequent uses. Finally a short section on chromium alloys and their exploitation in MEMS applications is reported.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
