The charging processes have been investigated in dielectrics used in RF MEMS capacitive switches. The investigation included various silicon oxides and nitrides. Finally, the effect of substrate, bottom electrode, has been taken into account.
Investigation of charging processes in dielectrics for RF mems capacitive switches
Giacomozzi, Flavio;Margesin, Benno;Colpo, Sabrina
2008-01-01
Abstract
The charging processes have been investigated in dielectrics used in RF MEMS capacitive switches. The investigation included various silicon oxides and nitrides. Finally, the effect of substrate, bottom electrode, has been taken into account.File in questo prodotto:
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