Thin film technology in the development of IRST-CCD/CMOS VLSI fabrication process

The development of an innovative CCD/CMOS VLSI technology specially designed to produce application specific smart optical sensors, is described. Process architecture and main technological parameters are outlined and, among the vacuum - thin film related problems specifically studied for this development, the gate oxide thinning phenomenon is presented and discussed

Titolo: Thin film technology in the development of IRST-CCD/CMOS VLSI fabrication process
Autori: 
Bellutti, Pierluigi
Boscardin, Maurizio
Giacomozzi, Flavio
Pedrotti, Severino
Zen, Mario
Soncini, Giovanni
Data di pubblicazione: 1993
Abstract: The development of an innovative CCD/CMOS VLSI technology specially designed to produce application specific smart optical sensors, is described. Process architecture and main technological parameters are outlined and, among the vacuum - thin film related problems specifically studied for this development, the gate oxide thinning phenomenon is presented and discussed
Handle: http://hdl.handle.net/11582/1035
Appare nelle tipologie:4.1 Contributo in Atti di convegno

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http://hdl.handle.net/11582/1035
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