Polycrystalline tantalum thin foils are implanted with molecular nitrogen ions.X-ray photoelectron spectroscopy results show preferential nitrogen loss during implantation and argon sputtering.
Glancing angle x-ray diffraction and x-ray photoelectron spectroscopy studies of nitrogen-implanted tantalum
Dapor, Maurizio
1989-01-01
Abstract
Polycrystalline tantalum thin foils are implanted with molecular nitrogen ions.X-ray photoelectron spectroscopy results show preferential nitrogen loss during implantation and argon sputtering.File in questo prodotto:
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