In this work we report preliminary results on ion implanted, silicon integrated microcalorimeters, whose design has been targeted to optimize the sensitivity of the device and to match the preamplifier electronics input impedance. Preliminary results of resistivity measurements in 0.05 to 4.2K temperature range carried out on first prototypes show that a reproducibility on the wafer better than +-5% can be achieved, thus allowing in perspective not only to reproducibly fabricate discrete devices, but also complete sensors based on 2D arrays of integrated microcalorimeters.

Silicon Integrated Microcalorimeters

Margesin, Benno;Zen, Mario;Soncini, Giovanni
1996-01-01

Abstract

In this work we report preliminary results on ion implanted, silicon integrated microcalorimeters, whose design has been targeted to optimize the sensitivity of the device and to match the preamplifier electronics input impedance. Preliminary results of resistivity measurements in 0.05 to 4.2K temperature range carried out on first prototypes show that a reproducibility on the wafer better than +-5% can be achieved, thus allowing in perspective not only to reproducibly fabricate discrete devices, but also complete sensors based on 2D arrays of integrated microcalorimeters.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11582/1307
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