Sfoglia per Autore
Topography developed by sputtering in a magnetic sector instruments: an AFM and SEM study’
2003-01-01 Iacob, Erica; Bersani, Massimo; Lui, Alberto; Giubertoni, Damiano; Barozzi, Mario; Anderle, Mariano
In situ sputtering rate measurement by laser interferometer applied to SIMS analyses
2003-01-01 Bersani, Massimo; Giubertoni, Damiano; Barozzi, Mario; E., Boscolo; Vanzetti, Lia Emanuela; Iacob, Erica; Anderle, Mariano
Ultra shallow junctions: Analytical solutions for 90 nm technology node"
2003-01-01 Giubertoni, Damiano; Barozzi, Mario; Bersani, Massimo; P., Lazzeri; M., Anderle
In situ sputtering rate measurement by laser interferometer applied to SIMS analyses
2003-01-01 Bersani, Massimo; Giubertoni, Damiano; Barozzi, Mario; S., Bertoli; Vanzetti, Lia Emanuela; Iacob, Erica; Anderle, Mariano
Diffusion and electrical activation of indium in silicon
2003-01-01 Silvia, Scalese; M., Italia; Antonio La, Magna; G., Mannino; V., Privitera; Bersani, Massimo; Giubertoni, Damiano; Barozzi, Mario; S., Solmi; P., Pichler
Hydrogen as a probe of the electronic properties of (InGa)(AsN)/GaAs heterostructures
2003-01-01 A. Bissiri M., Polimeni; Höger von Högersthal G., Baldassarri; M., Capizzi; Giubertoni, Damiano; Barozzi, Mario; Bersani, Massimo; D., Gollub; M., Fischer; A., Forchel
Diffusion and electrical activation of indium in silicon
2003-01-01 Silvia, Scalese; M., Italia; Antonio La, Magna; G., Mannino; V., Privitera; Bersani, Massimo; Giubertoni, Damiano; Barozzi, Mario; Sandro, Solmi; P., Pichler
Boron ultra shallow SIMS profiles optimization using oblique incidence oxygen beam
2003-01-01 Giubertoni, Damiano; Barozzi, Mario; E., Boscolo; M., Anderle; Bersani, Massimo
D-SIMS and ToF-SIMS quantitative depth profiles comparison on ultra thin oxynitrides
2003-01-01 Bersani, Massimo; Giubertoni, Damiano; Barozzi, Mario; Iacob, Erica; Vanzetti, Lia Emanuela; Anderle, Mariano; Lazzeri, Paolo; B., Crivelli; F., Zanderigo
Short-term and long-term RSF repeatability for CAMECA SC-Ultra SIMS measurements
2004-01-01 Barozzi, Mario; Giubertoni, Damiano; Anderle, Mariano; Bersani, Massimo
Low temperature oxidation of SiC preamorphized by ion implantation
2004-01-01 A., Poggi; R., Nipoti; S., Solmi; Barozzi, Mario; Vanzetti, Lia Emanuela
SIMS analytical conditions optimized to reduce the morphology induced by sputtering with an oblique O2+ beam
2004-01-01 Barozzi, Mario; Giubertoni, Damiano; S., Pederzoli; Iacob, Erica; Bersani, Massimo
Induced roughness during SIMS analysis by low energy Cs+ beam
2004-01-01 Iacob, Erica; Giubertoni, Damiano; Barozzi, Mario; S., Pederzoli; Bersani, Massimo
Ultra thin oxynitride profiles by XPS etch-back analyses
2004-01-01 Vanzetti, Lia Emanuela; Iacob, Erica; Barozzi, Mario; Giubertoni, Damiano; Bersani, Massimo; Anderle, Mariano; P., Bacciaglia; B., Crivelli; M. L., Polignano; M. E., Vitali
Rotating stage and shallow depth profiling on Cameca SC-Ultra apparatus
2004-01-01 S., Pederzoli; Barozzi, Mario; Iacob, Erica; Giubertoni, Damiano; Bersani, Massimo
Non destructive dose determination and depth profiling of arsenic ultrashallow junctions with total reflection X-ray fluorescence analysis compared to dynamic secondary ion mass spectrometry
2004-01-01 Pepponi, Giancarlo; C., Streli; P., Wobrauschek; N., Zoeger; K., Leuning; P., Pianetta; Giubertoni, Damiano; Barozzi, Mario; Bersani, Massimo
As ultra shallow depth profiling: comparison between SIMS and MEIS techniques
2004-01-01 Giubertoni, Damiano; Barozzi, Mario; S., Pederzoli; Anderle, Mariano; Bersani, Massimo; J. A., van den Berg; M., Werner
Optimization of secondary ion mass spectrometry ultra-shallow boron profiles using an oblique incidence O2+ beam
2004-01-01 Giubertoni, Damiano; Barozzi, Mario; Anderle, Mariano; Bersani, Massimo
Sample holder implement for very small samples on SC-Ultra SIMS instrument
2004-01-01 Barozzi, Mario; Giubertoni, Damiano; M., Sbetti; Anderle, Mariano; Bersani, Massimo
Arsenic shallow depth profiling: accurate quantification in SiO2/Si stack
2004-01-01 Barozzi, Mario; Giubertoni, Damiano; Anderle, Mariano; Bersani, Massimo
Titolo | Data di pubblicazione | Autore(i) | File |
---|---|---|---|
Topography developed by sputtering in a magnetic sector instruments: an AFM and SEM study’ | 1-gen-2003 | Iacob, Erica; Bersani, Massimo; Lui, Alberto; Giubertoni, Damiano; Barozzi, Mario; Anderle, Mariano | |
In situ sputtering rate measurement by laser interferometer applied to SIMS analyses | 1-gen-2003 | Bersani, Massimo; Giubertoni, Damiano; Barozzi, Mario; E., Boscolo; Vanzetti, Lia Emanuela; Iacob, Erica; Anderle, Mariano | |
Ultra shallow junctions: Analytical solutions for 90 nm technology node" | 1-gen-2003 | Giubertoni, Damiano; Barozzi, Mario; Bersani, Massimo; P., Lazzeri; M., Anderle | |
In situ sputtering rate measurement by laser interferometer applied to SIMS analyses | 1-gen-2003 | Bersani, Massimo; Giubertoni, Damiano; Barozzi, Mario; S., Bertoli; Vanzetti, Lia Emanuela; Iacob, Erica; Anderle, Mariano | |
Diffusion and electrical activation of indium in silicon | 1-gen-2003 | Silvia, Scalese; M., Italia; Antonio La, Magna; G., Mannino; V., Privitera; Bersani, Massimo; Giubertoni, Damiano; Barozzi, Mario; S., Solmi; P., Pichler | |
Hydrogen as a probe of the electronic properties of (InGa)(AsN)/GaAs heterostructures | 1-gen-2003 | A. Bissiri M., Polimeni; Höger von Högersthal G., Baldassarri; M., Capizzi; Giubertoni, Damiano; Barozzi, Mario; Bersani, Massimo; D., Gollub; M., Fischer; A., Forchel | |
Diffusion and electrical activation of indium in silicon | 1-gen-2003 | Silvia, Scalese; M., Italia; Antonio La, Magna; G., Mannino; V., Privitera; Bersani, Massimo; Giubertoni, Damiano; Barozzi, Mario; Sandro, Solmi; P., Pichler | |
Boron ultra shallow SIMS profiles optimization using oblique incidence oxygen beam | 1-gen-2003 | Giubertoni, Damiano; Barozzi, Mario; E., Boscolo; M., Anderle; Bersani, Massimo | |
D-SIMS and ToF-SIMS quantitative depth profiles comparison on ultra thin oxynitrides | 1-gen-2003 | Bersani, Massimo; Giubertoni, Damiano; Barozzi, Mario; Iacob, Erica; Vanzetti, Lia Emanuela; Anderle, Mariano; Lazzeri, Paolo; B., Crivelli; F., Zanderigo | |
Short-term and long-term RSF repeatability for CAMECA SC-Ultra SIMS measurements | 1-gen-2004 | Barozzi, Mario; Giubertoni, Damiano; Anderle, Mariano; Bersani, Massimo | |
Low temperature oxidation of SiC preamorphized by ion implantation | 1-gen-2004 | A., Poggi; R., Nipoti; S., Solmi; Barozzi, Mario; Vanzetti, Lia Emanuela | |
SIMS analytical conditions optimized to reduce the morphology induced by sputtering with an oblique O2+ beam | 1-gen-2004 | Barozzi, Mario; Giubertoni, Damiano; S., Pederzoli; Iacob, Erica; Bersani, Massimo | |
Induced roughness during SIMS analysis by low energy Cs+ beam | 1-gen-2004 | Iacob, Erica; Giubertoni, Damiano; Barozzi, Mario; S., Pederzoli; Bersani, Massimo | |
Ultra thin oxynitride profiles by XPS etch-back analyses | 1-gen-2004 | Vanzetti, Lia Emanuela; Iacob, Erica; Barozzi, Mario; Giubertoni, Damiano; Bersani, Massimo; Anderle, Mariano; P., Bacciaglia; B., Crivelli; M. L., Polignano; M. E., Vitali | |
Rotating stage and shallow depth profiling on Cameca SC-Ultra apparatus | 1-gen-2004 | S., Pederzoli; Barozzi, Mario; Iacob, Erica; Giubertoni, Damiano; Bersani, Massimo | |
Non destructive dose determination and depth profiling of arsenic ultrashallow junctions with total reflection X-ray fluorescence analysis compared to dynamic secondary ion mass spectrometry | 1-gen-2004 | Pepponi, Giancarlo; C., Streli; P., Wobrauschek; N., Zoeger; K., Leuning; P., Pianetta; Giubertoni, Damiano; Barozzi, Mario; Bersani, Massimo | |
As ultra shallow depth profiling: comparison between SIMS and MEIS techniques | 1-gen-2004 | Giubertoni, Damiano; Barozzi, Mario; S., Pederzoli; Anderle, Mariano; Bersani, Massimo; J. A., van den Berg; M., Werner | |
Optimization of secondary ion mass spectrometry ultra-shallow boron profiles using an oblique incidence O2+ beam | 1-gen-2004 | Giubertoni, Damiano; Barozzi, Mario; Anderle, Mariano; Bersani, Massimo | |
Sample holder implement for very small samples on SC-Ultra SIMS instrument | 1-gen-2004 | Barozzi, Mario; Giubertoni, Damiano; M., Sbetti; Anderle, Mariano; Bersani, Massimo | |
Arsenic shallow depth profiling: accurate quantification in SiO2/Si stack | 1-gen-2004 | Barozzi, Mario; Giubertoni, Damiano; Anderle, Mariano; Bersani, Massimo |
Legenda icone
- file ad accesso aperto
- file disponibili sulla rete interna
- file disponibili agli utenti autorizzati
- file disponibili solo agli amministratori
- file sotto embargo
- nessun file disponibile