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Titolo Data di pubblicazione Autore(i) File
Active feedback cooling of a SiN membrane resonator by electrostatic actuation 1-gen-2021 Borrielli, A.; Bonaldi, M.; Serra, E.; Sarro, P. M.; Morana, B.
An equivalent-circuit model for shunt-connected coplanar microelectromechanical system switches for high frequency applications 1-gen-2008 G., Bartolucci; R., Marcelli; Simone, Catoni; Margesin, Benno; Giacomozzi, Flavio; Mulloni, Viviana; Paola, Farinelli
Analytical transport cross section of medium energy positrons elastically scattered by complex atoms (Z=1-92) 1-gen-1995 Dapor, Maurizio
Arsenic uphill diffusion during shallow junction formation 1-gen-2006 M., Ferri; S., Solmi; A., Parisini; Bersani, Massimo; Giubertoni, Damiano; Barozzi, Mario
Backscattering of Low Energy Electrons from Carbon Films Deposited on Aluminum: a Monte Carlo Simulation 1-gen-2004 Dapor, Maurizio
Boron Ion Implantation through Mo and Mo Silicide Layers for Shallow Junction Formation 1-gen-1991 R., Angelucci; Sandro, Solmi; A., Armigliato; S., Guerri; M., Merli; A., Poggi; Canteri, Roberto
Chemical and compositional changes induced by N+ implantation in amorphous SiC films 1-gen-1993 Bensaada Laidani, Nadhira; M., Bonelli; R., Bertoncello; A., Glisenti; Calliari, Lucia; R., Capelletti; P., Ossi; A., Miotello; M., Elena; L., Guzman
Chromium oxide as a metal diffusion barrier layer: An x-ray absorption fine structure spectroscopy study 1-gen-2014 Ahamad Mohiddon, M. d.; K., Lakshun Naidu; M., Ghanashyam Krishna; G., Dalba; S. I., Ahmed; Rocca, Francesco
Codiffusion of arsenic and boron implanted in silicon 1-gen-1995 Sandro, Solmi; S., Valmorri; Canteri, Roberto
Codiffusion of arsenic and boron implanted in silicon 1-gen-1995 S., Solmi; S., Valmorri; Canteri, Roberto
Codiffusion of arsenic and phosphorus implanted in silicon 1-gen-1993 Solmi, S.; Maccagnani, P.; Canteri, R.
Codiffusion of Arsenic and Phosphorus Implanted Silicon 1-gen-1993 Sandro, Solmi; P., Maccagnani; Canteri, Roberto
Contacts shielding in nanowire field effect transistors 1-gen-2012 Alessandro, Pitanti; Stefano, Roddaro; Miriam S., Vitiello; Tredicucci, Alessandro
Correlation of local structure and electrical activation in arsenic ultrashallow junctions in silicon 1-gen-2008 Giubertoni, Damiano; Pepponi, Giancarlo; Gennaro, Salvatore; Bersani, Massimo; Mehmet, Sahiner; Stephen, Kelty; Roisin, Doherty; Majeed, Foad; Max, Kah; K. J., Kirkby; Joseph, Woicik; P., Pianetta
Degradation of REBCO coated conductors due to a combination of epoxy impregnation, thermal cycles, and quench: Characteristics and a method of alleviation 1-gen-2020 Yin, Shijian; Duranti, Mattia; Swenson, Charles A.; Li, Pei; Ye, Liyang; Zhang, Xingguo; Shen, Tengming
Depth profile investigations of silicon nanocrystals formed in sapphire by ion implantation 1-gen-2007 Selcuk, Yerci; I., Yildiz; M., Kulacki; U., Serincan; Barozzi, Mario; Bersani, Massimo
Dielectric charging in microwave microelectromechanical Ohmic series and capacitive shunt switches 1-gen-2009 Romolo, Marcelli; George, Papaioannu; Simone, Catoni; Giorgio De, Angelis; Andrea, Lucibello; Emanuela, Proietti; Margesin, Benno; Giacomozzi, Flavio; Francois, Deborgies
Diffusion and electrical activation of indium in silicon 1-gen-2003 Silvia, Scalese; M., Italia; Antonio La, Magna; G., Mannino; V., Privitera; Bersani, Massimo; Giubertoni, Damiano; Barozzi, Mario; S., Solmi; P., Pichler
Diffusion and electrical activation of indium in silicon 1-gen-2003 Silvia, Scalese; M., Italia; Antonio La, Magna; G., Mannino; V., Privitera; Bersani, Massimo; Giubertoni, Damiano; Barozzi, Mario; Sandro, Solmi; P., Pichler
Diffusion of Boron in Silicon During Post-Implantation Annealing 1-gen-1991 Sandro, Solmi; F., Baruffaldi; Canteri, Roberto
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